| Application | RCA Cleaning Etching Develop Solvent |
|---|---|
| Product Sample | Glass, Si wafer, Ceramic,… |
| Substrate Size | Max. 5G |
| Wafer handle | Single substrate or Cassette type |
| Chemical circulation & Tank | PTFE, Quartz, PP or SUS316L |
| Chemical heating | Max. 80℃ |
| Guide roller speed | Adjustable |
| Air Knife zone | Up and down site |
| Option | LCSS(Local Chemical Supply System) Auto fire extinguisher DI generator Wet scrubber |
| Control | PC control or PLC control |
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