Wet bench

AquaChem-CA

Application	RCA Cleaning Bench Etching Bench Develop Bench Solvent Bench Si wet etch Membrane & Micro channel formation V -Groove
Product Sample	Si, Sapphire, Glass, Ceramic, etc.
Substrate Size	4inch to Max. 8 inch
Wafer handle	Cassette type
Chemical Bath	PTFE, Quartz or SUS316L
Chemical heating	Max. 150℃
Sonic	Ultrasonic or Megasonic
QDR	N2 bubble, DI supply, DI shower, overflow
Option	Chemical circulation Cassette agitator LCSS(Local Chemical Supply System) Auto fire extinguisher DI generator Wet scrubber Wafer and Cassette dryer Wet scrubber.
Control	PC control or PLC control